Zeit | Montag | Dienstag | Mittwoch | Donnerstag | Freitag |
|---|
| 1.DS07:30 - 09:001. Woche | | | | Fetzer
Ü ConfComp
APB/E023/U |
| |
| 1.DS07:30 - 09:002. Woche | | | | Fetzer
Ü ConfComp
APB/E023/U |
| |
| 2.DS09:20 - 10:501. Woche | | Seitz, Steffen/Schroedter, Richard
V Neur. Net. a. Memr. H. Acc.
TOE/0317/H |
| Fetzer
V ConfComp
BEY/0138/H |
| Mannsfeld, Stefan
V Semicon. Techn. l
TOE/0317/H |
| Knoll, Carsten
Ü Python für Ing
TOE/0317/H |
|
| 2.DS09:20 - 10:502. Woche | | Seitz, Steffen/Schroedter, Richard
V Neur. Net. a. Memr. H. Acc.
TOE/0317/H |
| Fetzer
V ConfComp
BEY/0138/H |
| Mannsfeld, Stefan
V Semicon. Techn. l
TOE/0317/H |
| Knoll, Carsten
Ü Python für Ing
TOE/0317/H |
|
| 3.DS11:10 - 12:401. Woche | Fetzer
V Syst. Eng.
APB/E023/U |
| Kortke, Mathias
V Stoch. Sig.+Sys.
GÖR/0229/U |
| | | Fetzer
Ü Syst. Eng.
APB/E023/U |
|
| 3.DS11:10 - 12:402. Woche | Fetzer
V Syst. Eng.
APB/E023/U |
| Kortke, Mathias
V Stoch. Sig.+Sys.
GÖR/0229/U |
| | | Fetzer
Ü Syst. Eng.
APB/E023/U |
|
| 4.DS13:00 - 14:301. Woche | | Mannsfeld, Stefan
V Semicon. Techn. l
TOE/0317/H |
| Kortke, Mathias
Ü Stoch. Sig.+Sys.
GÖR/0229/U |
| von Hauff, Elizabeth
V Plasma Technology
BAR/0E85/U |
| Knobloch, Samuel
Ü RL-Sessions
HÜL/S186/H |
|
| 4.DS13:00 - 14:302. Woche | | Mannsfeld, Stefan
V Semicon. Techn. l
TOE/0317/H |
| Kortke, Mathias
Ü Stoch. Sig.+Sys.
GÖR/0229/U |
| von Hauff, Elizabeth
V Plasma Technology
BAR/0E85/U |
| Knobloch, Samuel
Ü RL-Sessions
HÜL/S186/H |
|
| 5.DS14:50 - 16:201. Woche | | | | von Hauff, Elizabeth
V Plasma Technology
BAR/0E85/U |
| von Hauff, Elizabeth
Ü Plasma Technology
BAR/0E85/U |
|
| 5.DS14:50 - 16:202. Woche | | | | von Hauff, Elizabeth
V Plasma Technology
BAR/0E85/U |
| von Hauff, Elizabeth
Ü Plasma Technology
BAR/0E85/U |
|