Zeit | Montag | Dienstag | Mittwoch | Donnerstag | Freitag |
|---|
| 1.DS07:30 - 09:001. Woche | | | | Fetzer Ü ConfComp APB/E023/U |
| |
| 1.DS07:30 - 09:002. Woche | | | | Fetzer Ü ConfComp APB/E023/U |
| |
| 2.DS09:20 - 10:501. Woche | | Seitz, Steffen/Schroedter, Richard V Neur. Net. a. Memr. H. Acc. TOE/0317/H |
| Fetzer V ConfComp BEY/0138/H |
| Mannsfeld, Stefan V Semicon. Techn. l TOE/0317/H |
| Knoll, Carsten Ü Python für Ing TOE/0317/H |
|
| 2.DS09:20 - 10:502. Woche | | Seitz, Steffen/Schroedter, Richard V Neur. Net. a. Memr. H. Acc. TOE/0317/H |
| Fetzer V ConfComp BEY/0138/H |
| Mannsfeld, Stefan V Semicon. Techn. l TOE/0317/H |
| Knoll, Carsten Ü Python für Ing TOE/0317/H |
|
| 3.DS11:10 - 12:401. Woche | Fetzer V Syst. Eng. APB/E023/U |
| Kortke, Mathias V Stoch. Sig.+Sys. GÖR/0229/U |
| | | Fetzer Ü Syst. Eng. APB/E023/U |
|
| 3.DS11:10 - 12:402. Woche | Fetzer V Syst. Eng. APB/E023/U |
| Kortke, Mathias V Stoch. Sig.+Sys. GÖR/0229/U |
| | | Fetzer Ü Syst. Eng. APB/E023/U |
|
| 4.DS13:00 - 14:301. Woche | Saggar, S. V OrgSem for Opt BAR/0213/H |
| Mannsfeld, Stefan V Semicon. Techn. l TOE/0317/H |
| Kortke, Mathias Ü Stoch. Sig.+Sys. GÖR/0229/U |
| von Hauff, Elizabeth V Plasma Technology BAR/0E85/U |
| Knobloch, Samuel Ü RL-Sessions HÜL/S186/H |
|
| 4.DS13:00 - 14:302. Woche | Saggar, S. V OrgSem for Opt BAR/0213/H |
| Mannsfeld, Stefan V Semicon. Techn. l TOE/0317/H |
| Kortke, Mathias Ü Stoch. Sig.+Sys. GÖR/0229/U |
| von Hauff, Elizabeth V Plasma Technology BAR/0E85/U |
| Knobloch, Samuel Ü RL-Sessions HÜL/S186/H |
|
| 5.DS14:50 - 16:201. Woche | | | | von Hauff, Elizabeth V Plasma Technology BAR/0E85/U |
| von Hauff, Elizabeth Ü Plasma Technology BAR/0E85/U |
|
| 5.DS14:50 - 16:202. Woche | | | | von Hauff, Elizabeth V Plasma Technology BAR/0E85/U |
| von Hauff, Elizabeth Ü Plasma Technology BAR/0E85/U |
|
| 6.DS16:40 - 18:101. Woche | Saggar, S. S OrgSem for Opt BAR/0E85/U |
| | | | |
| 6.DS16:40 - 18:102. Woche | Saggar, S. S OrgSem for Opt BAR/0E85/U |
| | | | |